BIBFRAME Work

Title

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Type

• Text
• Monograph

Contribution

• Shin, Youngsoo (author )
• Shim, Seongbo (author )

Subject

• TBN
• Z12000
• T24068
• P25140
• T18000
• Nanotechnology (LCSH)
• Nanoscience (LCSH)
• Semiconductors (LCSH)
• TEC027000 (BISACSH)
• Z14000
• Electronic circuits (LCSH)
• P25150
• Nanostructures (LCSH)
• Electronics--Materials (LCSH)
• Optical materials (LCSH)

Language

• English

Classification

• LCC: T174.7 (Status: not used by assigner) (Status: upgraded prepub)
• LCC: TA418.9.N35 (Status: not used by assigner) (Status: upgraded prepub)
• DDC: 620.115

Content

• text

Summary

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Table of Contents

Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.

Authorized Access Point

Shim, Seongbo. Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Admin Metadata

• Date: 2026-09-11T20:14:47.142295+00:00
• Agent: cbc
• Status: c
• Derived from: 21680281

Admin Metadata

• Date: 2026-09-11
• Cataloger id: Unknown
• Description level: http://id.loc.gov/ontologies/bibframe-2-6-0/
• Description language: eng
• Description authentication: pcc